High-throughput synthesis of modified Fresnel zone plate arrays via ion beam lithography

• Kahraman Keskinbora,
• Umut Tunca Sanli,
• Margarita Baluktsian,
• Corinne Grévent,
• Markus Weigand and
• Gisela Schütz

Beilstein J. Nanotechnol. 2018, 9, 2049–2056, doi:10.3762/bjnano.9.194

• )3CH3C5H4Pt, as the metal-organic precursor gas. Structure of the FZP The patterning and ion beam parameters tabulated in Table 1 resulted in a linear dosage of 0.8 pC/µm, and the successful fabrication of the FZP with 50 µm diameter, 110 nm nominal thickness and 30 nm Δr in just 8 min and 23 s. The dosage is

Synthesis of carbon nanowalls from a single-source metal-organic precursor

• André Giese,
• Sebastian Schipporeit,
• Volker Buck and
• Nicolas Wöhrl

Beilstein J. Nanotechnol. 2018, 9, 1895–1905, doi:10.3762/bjnano.9.181

• the use of the single-source metal-organic precursor aluminium acetylacetonate. This precursor is relatively unknown in combination with the ICP-PECVD deposition method in literature and, thus, based on our previous publication is further investigated in this work to better understand the influence of

• acetylacetonate; carbon nanowalls; growth zones; ICP PECVD; metal-organic precursor; Introduction The first report of the synthesis of carbon nanowalls (CNWs), i.e., wall-like carbon nanosheets aligned perpendicular to the substrate, was given by Wu and co-workers [1]. The average thickness of these sheets was

• -workers [18]. This growth model can be adapted to the synthesis from the metal-organic precursor (aluminium acetylacetonate, C15H21AlO6) used in this work (Figure 1). At the beginning of the deposition process, a very thin carbon or CxAly layer is deposited onto the substrate. Carbon species are further

A novel copper precursor for electron beam induced deposition

• Caspar Haverkamp,
• George Sarau,
• Mikhail N. Polyakov,
• Ivo Utke,
• Marcos V. Puydinger dos Santos,
• Silke Christiansen and
• Katja Höflich

Beilstein J. Nanotechnol. 2018, 9, 1220–1227, doi:10.3762/bjnano.9.113

• by FEBID, typically a metal-organic precursor is used, which frequently results in a carbonaceous matrix with small metal inclusions [8]. Fabrication of copper-containing deposits by electron beam induced deposition was shown with Cu(I) and Cu(II) precursors containing the ligand

• deposition should furthermore provide for conductive deposits with a preferably high copper content. Here, the metal-organic precursor bis(tert-butylacetoacetato)Cu(II) (CAS: 23670-45-3, C16H26CuO6) is introduced as a fluorine-free alternative. This precursor is known from chemical vapor deposition (CVD

Towards the third dimension in direct electron beam writing of silver

• Katja Höflich,
• Jakub Mateusz Jurczyk,
• Katarzyna Madajska,
• Maximilian Götz,
• Luisa Berger,
• Carlos Guerra-Nuñez,
• Caspar Haverkamp,
• Iwona Szymanska and
• Ivo Utke

Beilstein J. Nanotechnol. 2018, 9, 842–849, doi:10.3762/bjnano.9.78

• ]. For the deposition of metals, typically metal-organic precursor compounds are employed [3]. The organic ligands bring the desired metal into the gas phase. Hence, a sufficiently high stability and vapor pressure is usually accompanied by a large amount of carbon in the compound [10]. This carbon is

Direct writing of gold nanostructures with an electron beam: On the way to pure nanostructures by combining optimized deposition with oxygen-plasma treatment

• Domagoj Belić,
• Mostafa M. Shawrav,
• Emmerich Bertagnolli and
• Heinz D. Wanzenboeck

Beilstein J. Nanotechnol. 2017, 8, 2530–2543, doi:10.3762/bjnano.8.253

• diminished using a two-step process – a combination of optimized deposition followed by appropriate postdeposition cleaning. Starting from the common metal-organic precursor Me2-Au-tfac, it is demonstrated that the Au content in pristine FEBID nanostructures can be increased from 30 atom % to as much as 72

• functionalization. Conclusion In summary, we investigated a FEBID experimental parameter subspace, aiming to fabricate 2D and 3D nanostructures with a high Au content, starting from a common metal-organic precursor, Me2-Au-tfac. In the first instance, we realized vertical free-standing FEBID Au nanopillars having a

Synthesis of metal-fluoride nanoparticles supported on thermally reduced graphite oxide

• Alexa Schmitz,
• Kai Schütte,
• Vesko Ilievski,
• Juri Barthel,
• Laura Burk,
• Rolf Mülhaupt,
• Junpei Yue,
• Bernd Smarsly and
• Christoph Janiak

Beilstein J. Nanotechnol. 2017, 8, 2474–2483, doi:10.3762/bjnano.8.247

• presence of sulfur functionalities. The nanoparticles exhibited mostly diameters of less than 30 nm. For cobalt it was only possible to support non-aggregated CoF2 particles on TRGO-SH. The results support the advantages of the metal-organic precursor concept based on metal amidinates together with non

Growth and characterization of CNT–TiO₂ heterostructures

• Yucheng Zhang,
• Ivo Utke,
• Johann Michler,
• Gabriele Ilari,
• Marta D. Rossell and
• Rolf Erni

Beilstein J. Nanotechnol. 2014, 5, 946–955, doi:10.3762/bjnano.5.108

• surfaces are also non-reactive and are used to render the ALD process selective in self-assembled monolayer molecules [23]. Only surface defects on CNTs and graphene allow for the chemisorption of metal-organic precursor molecules. Basically, surface functional groups need to be generated on pristine

Spontaneous dissociation of Co₂(CO)₈ and autocatalytic growth of Co on SiO₂: A combined experimental and theoretical investigation

• Kaliappan Muthukumar,
• Harald O. Jeschke,
• Roser Valentí,
• Evgeniya Begun,
• Johannes Schwenk,
• Fabrizio Porrati and
• Michael Huth

Beilstein J. Nanotechnol. 2012, 3, 546–555, doi:10.3762/bjnano.3.63

• Frankfurt am Main, Germany present address: Empa, CH-8600 Dübendorf, Switzerland 10.3762/bjnano.3.63 Abstract We present experimental results and theoretical simulations of the adsorption behavior of the metal–organic precursor Co2(CO)8 on SiO2 surfaces after application of two different pretreatment steps

Radiation-induced nanostructures: Formation processes and applications

• Michael Huth

Beilstein J. Nanotechnol. 2012, 3, 533–534, doi:10.3762/bjnano.3.61

• . Different processes, such as dissociative electron attachment, neutral dissociation or dissociative ionization act together in breaking selected bonds in (mostly) metal–organic precursor molecules. On the other hand, low-energy electrons also play a role in the radiation damage induced by ionizing radiation